Semiconductor grade ultra-pure refractory metal powder
By leveraging internationally advanced plasma PDR application technology, we have successfully produced ultra-high purity refractory metal powders including tungsten, molybdenum, and tantalum. Notably, the spherical tungsten powder, prepared through a combination of powder sintering techniques, achieves not only ultra-high purity but also precise grain orientation control of the target material. This breakthrough paves a new path for the manufacturing of ultra-high purity (exceeding 99.999%) target materials. The oxygen content can be maintained below 50 PPM, facilitating import substitution. The refractory metal spherical powders produced via the plasma PDR technology exhibit significant advantages in key performance indicators such as fluidity, bulk density, tapped density, sphericity, purity, and oxygen content.